Noise figure reduction of a GaAs-based pHEMT transistor by optimizationof the gate barrier layer thickness using numerical simulation

Authors

  • Elena I. Vasilkova Alferov University, 8/3 Khlopina st., St. Petersburg 194021, Russian Federation
  • Kseniia Yu. Shubina Alferov University, 8/3 Khlopina st., St. Petersburg 194021, Russian Federation
  • Denis S. Papylev ITMO University, 49, bldg. A, Kronverksky pr., St. Petersburg 197101, Russian Federation
  • Vladislav V. Andryushkin ITMO University, 49, bldg. A, Kronverksky pr., St. Petersburg 197101, Russian Federation
  • Evgeny V. Pirogov Alferov University, 8/3 Khlopina st., St. Petersburg 194021, Russian Federation
  • Andrey G. Gladyshev Alferov University, 8/3 Khlopina st., St. Petersburg 194021, Russian Federation
  • Innokenty I. Novikov Alferov University, 8/3 Khlopina st., St. Petersburg 194021, Russian Federation
  • Leonid Ya. Karachinsky Alferov University, 8/3 Khlopina st., St. Petersburg 194021, Russian Federation
  • Maxim S. Sobolev Alferov University, 8/3 Khlopina st., St. Petersburg 194021, Russian Federation

DOI:

https://doi.org/10.17308/kcmf.2026.28/13967

Keywords:

GaAs-pHEMT,, Numerical Simulation, Noise figure, Transconductance

Abstract

Objectives: The objective of the present work is to reduce the noise figure of a GaAs-based pHEMT transistor by optimizing the thickness of the gate barrier layer of the transistor heterostructure, and to investigate the applicability of numerical simulation methods for this purpose.

Experimental: Numerical simulation of the transconductance and drain current of a low-noise pHEMT transistor was carried out using the drift-diffusion and hydrodynamic models of charge carrier transport in the channel.

Conclusions: It is shown that the hydrodynamic model describes the experimental results for a pHEMT transistor with a sub-micron gate length more accurately than the drift-diffusion model. The optimal heterostructure design of a low-noise pHEMT transistor was determined by means of the hydrodynamic numerical model, which resulted in a reduction of the minimum noise figure of the pHEMT transistor by 0.1 dB to a level of 0.7 dB

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Author Biographies

  • Elena I. Vasilkova, Alferov University, 8/3 Khlopina st., St. Petersburg 194021, Russian Federation

    Junior Researcher, Alferov University (Saint Petersburg, Russian Federation)

  • Kseniia Yu. Shubina, Alferov University, 8/3 Khlopina st., St. Petersburg 194021, Russian Federation

    Cand. Sci. (Phys.–Math.), Кesearcher, Alferov University (Saint Petersburg, Russian Federation)

  • Denis S. Papylev, ITMO University, 49, bldg. A, Kronverksky pr., St. Petersburg 197101, Russian Federation

    Engineer, ITMO University (Saint Petersburg, Russian Federation)

  • Vladislav V. Andryushkin, ITMO University, 49, bldg. A, Kronverksky pr., St. Petersburg 197101, Russian Federation

    Cand. Sci. (Tech.), Senior Researcher, ITMO University (Saint Petersburg, Russian Federation)

  • Evgeny V. Pirogov, Alferov University, 8/3 Khlopina st., St. Petersburg 194021, Russian Federation

    Researcher, Alferov University (Saint Petersburg, Russian Federation)

  • Andrey G. Gladyshev, Alferov University, 8/3 Khlopina st., St. Petersburg 194021, Russian Federation

    к. ф.-м. н., с. н. с., СП- бАУ РАН им. Ж. И. Алферова (Санкт-Петербург, Российская Федерация)

  • Innokenty I. Novikov, Alferov University, 8/3 Khlopina st., St. Petersburg 194021, Russian Federation

    Cand. Sci. (Phys.–Math.), Senior Researcher, Alferov University (Saint Petersburg, Russian Federation)

  • Leonid Ya. Karachinsky, Alferov University, 8/3 Khlopina st., St. Petersburg 194021, Russian Federation

    Dr. Sci. (Tech.), Chief Researcher, Alferov University (Saint Petersburg, Russian Federation)

  • Maxim S. Sobolev, Alferov University, 8/3 Khlopina st., St. Petersburg 194021, Russian Federation

    Cand. Sci. (Phys.–Math.), Head of the Laboratory, Alferov University (Saint Petersburg, Russian Federation)

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Published

2026-09-22

Issue

Section

Original articles

How to Cite

Noise figure reduction of a GaAs-based pHEMT transistor by optimizationof the gate barrier layer thickness using numerical simulation. (2026). Kondensirovannye Sredy I Mezhfaznye Granitsy = Condensed Matter and Interphases, 28(3), 388-395. https://doi.org/10.17308/kcmf.2026.28/13967