Анализ фазового состава аморфной пленки Mo-Si,полученной ионно-лучевым распылением по данным УМРЭС и рентгеновской рефлектометрии

Authors

  • Konstantin A. Barkov 1ФГБОУ ВО «Воронежский государственный университет», Университетская пл., 1, Воронеж 394018, Российская Федерация
  • Ivan V. Polshin ФГБОУ ВО «Воронежский государственный университет», Университетская пл., 1, Воронеж 394018, Российская Федерация
  • Sergey A. Ivkov ФГБОУ ВО «Воронежский государственный университет», Университетская пл., 1, Воронеж 394018, Российская Федерация
  • Yaroslav A. Peshkov ФГБОУ ВО «Воронежский государственный университет», Университетская пл., 1, Воронеж 394018, Российская Федерация
  • Selby Y. Khydyrova Bauman Moscow State Technical University, 5 2‑nd, Baumanskaya st., Moscow 105005, Russian Federation
  • Konstantin M. Moiseev Voronezh State University, 1, Universitetskaya pl., Voronezh 394018, Russian Federation , Bauman Moscow State Technical University, 5 2‑nd, Baumanskaya st., Moscow 105005, Russian Federation
  • Evgenii S. Kersnovsky ФГБОУ ВО «Воронежский государственный университет», Университетская пл., 1, Воронеж 394018, Российская Федерация
  • Igor E. Zanin ФГБОУ ВО «Воронежский государственный университет», Университетская пл., 1, Воронеж 394018, Российская Федерация
  • Alexandra K. Pelagina Voronezh State University, 1, Universitetskaya pl., Voronezh 394018, Russian Federation
  • Nikita S. Buylov АО «Научно-исследовательский институт электронной техники», ул. Старых Большевиков, 5, Воронеж 394033, Российская Федерация , ФГБОУ ВО «Воронежский государственный университет», Университетская пл., 1, Воронеж 394018, Российская Федерация
  • Van Tu Tran University of Medicine and Pharmacy at Ho Chi Minh city, 217 Hong Bang Street, Wars 11, District 5, HCMC, Viet Nam
  • Alexandr E. Nikonov Voronezh State Technical University, 84, 20th Anniversary of October st., Voronezh 394006, Russian Federation
  • Aleksandr V. Sitnikov ФГБОУ ВО Воронежский государственный технический университет, ул. 20‑летия Октября, 84, Воронеж 394006, Российская Федерация

DOI:

https://doi.org/10.17308/kcmf.2026.28/13804

Keywords:

сверхпроводимость, Mo3Si, пленки Mo-Si, аморфные силициды, ионно-лучевое распыление, ультрамягкая рентгеновская эмиссионная спектроскопия, рентгеновская рефлектометрия

Abstract

Анализ фазового состава аморфной пленки Mo-Si, полученной ионно-лучевым распылением по данным УМРЭС и рентгеновской рефлектометрии

Downloads

Download data is not yet available.

Author Biographies

  • Konstantin A. Barkov, 1ФГБОУ ВО «Воронежский государственный университет», Университетская пл., 1, Воронеж 394018, Российская Федерация

    Cand. Sci. (Phys.-Math.), Head of the Laboratory, Department of Solid State Physics and Nanostructures, Voronezh State University (Voronezh, Russian Federation)

  • Ivan V. Polshin, ФГБОУ ВО «Воронежский государственный университет», Университетская пл., 1, Воронеж 394018, Российская Федерация

    student, Department of Solid State Physics and Nanostructures, Voronezh State University (Voronezh, Russian Federation)

  • Sergey A. Ivkov, ФГБОУ ВО «Воронежский государственный университет», Университетская пл., 1, Воронеж 394018, Российская Федерация

    Cand. Sci. (Phys.-Math.), Leading Electronics Engineer, Department of Solid State Physics and Nanostructures, Voronezh State University (Voronezh, Russian Federation)

  • Yaroslav A. Peshkov, ФГБОУ ВО «Воронежский государственный университет», Университетская пл., 1, Воронеж 394018, Российская Федерация

    Cand. Sci. (Phys.-Math.), Research Associate, Department of Solid State Physics and Nanostructures, Voronezh State University (Voronezh, Russian Federation)

  • Selby Y. Khydyrova, Bauman Moscow State Technical University, 5 2‑nd, Baumanskaya st., Moscow 105005, Russian Federation

    postgraduate student, Department of Electronic Technologies in Mechanical Engineering, Bauman Moscow State Technical University (Moscow, Russian Federation)

  • Konstantin M. Moiseev, Voronezh State University, 1, Universitetskaya pl., Voronezh 394018, Russian Federation, Bauman Moscow State Technical University, 5 2‑nd, Baumanskaya st., Moscow 105005, Russian Federation

    Assistant Professor, Department of Electronic Technologies in Mechanical Engineering, Bauman Moscow State Technical University (Moscow, Russian Federation)

  • Evgenii S. Kersnovsky, ФГБОУ ВО «Воронежский государственный университет», Университетская пл., 1, Воронеж 394018, Российская Федерация

    student, Department of Solid State Physics and Nanostructures, Voronezh State University (Voronezh, Russian Federation)

  • Igor E. Zanin, ФГБОУ ВО «Воронежский государственный университет», Университетская пл., 1, Воронеж 394018, Российская Федерация

    Cand, Sci. (Phys.-Math.), Assistant Professor, General Physics Department, Voronezh State University (Voronezh, Russian Federation)

  • Alexandra K. Pelagina, Voronezh State University, 1, Universitetskaya pl., Voronezh 394018, Russian Federation

    Engineer-Physicist, Voronezh State University (Voronezh, Russian Federation)

  • Nikita S. Buylov, АО «Научно-исследовательский институт электронной техники», ул. Старых Большевиков, 5, Воронеж 394033, Российская Федерация, ФГБОУ ВО «Воронежский государственный университет», Университетская пл., 1, Воронеж 394018, Российская Федерация

    Cand. Sci. (Phys.-Math.), Assistant Professor, Department of Solid State Physics and Nanostructures, Voronezh State University; Engineer, Research Institute of Electronic Technology (Voronezh, Russian Federation)

  • Van Tu Tran, University of Medicine and Pharmacy at Ho Chi Minh city, 217 Hong Bang Street, Wars 11, District 5, HCMC, Viet Nam

    PhD, Lecturer, Faculty of Fundamental Sciences, Department of Physics, University of Medicine and Pharmacy at Ho Chi Minh city (Ho Chi Minh city, Viet Nam)

  • Alexandr E. Nikonov, Voronezh State Technical University, 84, 20th Anniversary of October st., Voronezh 394006, Russian Federation

    Cand. Sci. (Phys.-Math.), Research Engineer, Department of Solid-State Electronics, Voronezh State Technical University (Voronezh, Russian Federation)

  • Aleksandr V. Sitnikov, ФГБОУ ВО Воронежский государственный технический университет, ул. 20‑летия Октября, 84, Воронеж 394006, Российская Федерация

    Dr. Sci. (Phys.-Math.), Full Professor, Departments of Solid-State Electronics, Voronezh State Technical University (Voronezh, Russian Federation)

References

1. Banerjee A., Baker L. J., Doye, A., … Hadfield, R. H. Characterisation of amorphous molybdenum silicide (MoSi) superconducting thin films and nanowires. Superconductor Science and Technology. 2017;30(8): 084010. https://doi.org/10.1088/1361-6668/aa76d8

2. Grotowski S., Zugliani L., Jonas B., … Finley J. Optimizing the growth conditions of superconducting MoSi thin films for single photon detection. Scientific Reports. 2025;15(1): 2438. https://doi.org/10.1038/s41598-025-86303-5

3. Esmaeil Zadeh I., Chang J., Los J. W. N., … Zwiller V. Superconducting nanowire single-photon detectors: a perspective on evolution, state-of-the-art, future developments, and applications. Applied Physics Letters. 2021;118(19). https://doi.org/10.1063/5.0045990

4. Tütüncü H. M., Bağcı S., Srivastava G. P. Electronic structure, phonons, and electron-phonon interaction in Mo3Si. Physical Review B. 2010;82(21): 214510. https://doi.org/10.1103/PhysRevB.82.214510

5. Nakajima H., Ikebe M., Muto Y., Fujimori H. Superconducting properties of Mo/Si multilayer films. Journal of Applied Physics. 1989;65(4): 1637–1643. https://doi.org/10.1063/1.342931

6. Johnson W. L., Tsuei C. C., Raider S. I., Laibowitz R. B. A study of amorphous superconducting transition metal-metalloid alloys produced by coevaporation. Journal of Applied Physics. 1979;50(6): 4240–4245. https://doi.org/10.1063/1.326456

7. Villars P., Hulliger F. (eds.). Mo5Si3 rt superconducting transition temperature. Springer Materials (online database). Springer; Heidelberg (Dataset ID: ppp_93685f1283dc9fc025e4047e79afd71e).

8. Xu J., Hu W., Yan Y., Lu X., Munroe P., Xie Z.-H. Microstructure and mechanical properties of a Mo-toughened Mo3Si-based in situ nanocomposite. Vacuum. 2014;109: 112–119. https://doi.org/10.1016/j.vacuum.2014.07.004

9. Gnesin I., Gnesin B. Composition of the Mo-Mo3Si alloys obtained via various methods. International Journal of Refractory Metals and Hard Materials. 2020;88: 105188. https://doi.org/10.1016/j.ijrmhm.2020.105188

10. Gridnev S. A., Kalinin Yu. E., Sitnikov A. V., Stognei O. V. Nonlinear phenomena in nano- and microheterogeneous systems. Moscow: Binom Publ.; 2012. (In Russ.)

11. Gray A. X., Karel J., Minár J., … Fadley C. S. Hard X-ray photoemission study of near-Heusler FexSi1-x alloys. Physical Review B. 2011;83(19): 195112. https://doi.org/10.1103/PhysRevB.83.195112

12. Momma K., Izum F. Appl. VESTA 3 for three-dimensional visualization of crystal, volumetric and morphology data. Applied Crystallography. 2011;44(6): 1272–1276. https://doi.org/10.1107/S0021889811038970

13. Bergmann U., Glatzel P. X-ray emission spectroscopy. Photosynthesis Research. 2009;102(2-3): 255–266. https://doi.org/10.1007/s11120-009-9483-6

14. Shulakov A. S. X-ray emission depth-resolved spectroscopy for investigation of nanolayers. Journal of Structural Chemistry. 2011;52(S1): 1–12. https://doi.org/10.1134/S0022476611070018.

15. Glavic A., Björck M. GenX 3: the latest generation of an established tool. Applied Crystallography. 2022;55(4): 1063–1071. https://doi.org/10.1107/S1600576722006653

16. Parratt L. G. Surface studies of solids by total reflection of X-rays. Physical Review. 1954;95(2): 359. https://doi.org/10.1103/PhysRev.95.359

17. Jarrige I., Capron N., Jonnard P. Electronic structure of Ni and Mo silicides investigated by X-ray emission spectroscopy and density functional theory. Physical Review B. 2009;79(3): 035117. https://doi.org/10.1103/PhysRevB.79.035117

18. W. Speier E. v. Leuken, J. C. Fuggle D. D. Sarma, L. Kumar, B. Dauth K. H. J. Buschow. Photoemission and inverse photoemission of transition-metal silicides. Physical Review B. 1989;39(9): 6008. https://doi.org/10.1103/PhysRevB.39.6008

19. Speier W., Leuken E. V., Fuggle J. C., … Buschow K. H. J. Soft-X-ray-emission studies of bulk Fe3Si, FeSi, and FeSi2, and implanted iron silicides. Physical Review B. 1992;46(15): 9446. https://doi.org/10.1103/PhysRevB.46.9446

20. Domashevskaya E. P., Yurakov Yu A. Specific features of electron structures of some thin film d-silicides. Journal of Electron Spectroscopy and Related Phenomena. 1998;96(1-3): 195–208. https://doi.org/10.1016/S0368-2048(98)00236-9

21. Miyata N., Imazono T., Ishikawa S., Arai A., Yanagihara M., Watanabe M. Buried interfaces of heat-loaded Mo/Si multilayers studied by soft-X-ray emission spectroscopy. Surface Review and Letters. 2002;09(02): 663–667. https://doi.org/10.1142/S0218625X0200283X

22. Nemoshkalenko V. V., Shpak A. P., Krivitsky V. P., Nikolajev L. I. X-ray Kβ- and L2,3- emission bands of pure silicon and silicon in Mo-Si compounds Physics Letters A. 45.5 (1973): 369-370. https://doi.org/10.1016/0375-9601(73)90241-7

23. Weijs P. J. W., van Leuken H., de Groot R. A., … Buschow K. H. J. X-ray-emission studies of chemical bonding in transition-metal silicides. Physical Review B. 1991;44(15): 8195–8203. https://doi.org/10.1103/PhysRevB.44.8195

24. Daillant J., Gibaud A. (eds.). X-ray and neutron reflectivity: principles and applications. Vol. 770. Springer; 2008.

25. Poate J. M., Tu K. N., Mayer J. W. (eds.). Thin films: interdiffusion and reactions. John Wiley & Sons; 1978.

26. Ma H.-P., Yang J.-H., Yang J.-G., … Lu H.-L. Systematic study of the SiOx film with different stoichiometry by plasma-enhanced atomic layer deposition and its application in SiOx/SiO2 super-lattice. Nanomaterials. 2019;9(1): 55. https://doi.org/10.3390/nano9010055

27. Chu F., Thoma D. J., McClellan K. J., Peralta P. Mo5Si3 single crystals: physical properties and mechanical behavior. Materials Science and Engineering: A. 1999;261(1-2): 44–52. https://doi.org/10.1016/S0921-5093(98)01048-X

28. Suzuki K., H. Fujimori K. Hashimoto. Amorphous metals*. Moscow: Metallurgy Publ.; 1987. 328. (In Russ.)

29. Lefèvre A., Lewis L. J., Martinu L., Wertheimer M. R. Structural properties of silicon dioxide thin films densified by medium-energy particles. Physical Review B. 2001;64(11): 115429. https://doi.org/10.1103/PhysRevB.64.115429

30. Linke J., Rinder J., Hahn G., Terheiden B. Correlation between the optical bandgap and the monohydride bond density of hydrogenated amorphous silicon. Journal of Non-Crystalline Solids: 2020;X(5); 100044. https://doi.org/10.1016/j.nocx.2020.100044

31. Yanagisawa S., Fukuyama T. Preparation of molybdenum silicide films by reactive sputtering. Journal of The Electrochemical Society. 1980:127(5): 1120–1124. https://doi.org/10.1149/1.2129830

32. Beckman S., Cook B. A., Akinc M. Analysis of electrical resistivity of compositions within the Mo-Si-B ternary system, part I: single phase compounds. Materials Science and Engineering: A. 2001;298(1-2): 120–126. https://doi.org/10.1016/S0921-5093(00)01290-9

33. Ito K., Hayashi T., Nakamura H. Electrical and thermal properties of single crystalline Mo5X3 (X= Si, B, C) and related transition metal 5-3 silicides. Intermetallics. 2004;12(4): 443–450. https://doi.org/10.1016/j.intermet.2003.12.008

34. Huebener R. P. Nonlinear effects at high flux-flow electric fields. Journal of Physics: Condensed Matter. 2009;21(25): 254208. https://doi.org/10.1088/0953-8984/21/25/254208

35. Angelucci R., Solmi S., Armigliato A., … Canteri R. Boron ion implantation through Mo and Mo silicide layers for shallow junction formation. Journal of Applied Physics. 1991;69(7): 3962–3967. https://doi.org/10.1063/1.348457

36. Angelucci R., Solmi S., Armigliato A., … Poggi A. Arsenic ion implantation through Mo and Mo silicide layers for shallow junction formation. Solid-State Electronics. 1992;35(7): 941–947. https://doi.org/10.1016/0038-1101(92)90323-5

37. Martin T. L., Mahan J. E. Electronic transport and microstructure in MoSi2 thin films. Journal of Materials Research. 1986;1(3): 493–502. https://doi.org/10.1557/JMR.1986.0493

Published

2026-06-25

Issue

Section

Short communication

How to Cite

Анализ фазового состава аморфной пленки Mo-Si,полученной ионно-лучевым распылением по данным УМРЭС и рентгеновской рефлектометрии. (2026). Kondensirovannye Sredy I Mezhfaznye Granitsy = Condensed Matter and Interphases, 28(2), 305-3015. https://doi.org/10.17308/kcmf.2026.28/13804