Technology for the production and studying the gas-dynamic characteristics of microfluidic gas chromatographic columns on silicon substrates
Abstract
The article presents a technology for the production of microfluidic gas chromatographic columns on the plane of silicon substrates with a channel length of 1 m and a channel cross section of 150x240 μm. The channel was formed by plasma-chemical etching and it was sealed using anode bonding. The results of the modelling and experimental study of the gas-dynamic characteristics of the manufactured column are presented, it was shown that the results of mathematical modelling differ from the experimental data by less than 1%, which allows using the constructed model to calculate the optimal location of the pillars inside the microfluidic channel in order to obtain the maximum loading capacity and efficiency of the manufactured gas chromatographic column.
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References
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