Phase composition and texture of palladium (II) oxide thin films on SiO2/Si
Abstract
The objects of the study are nanostructures based on palladium (II) oxide of various elemental compositions and morphological organization.
The aim of the work is to establish the influence of synthesis conditions on the phase composition and texture of thin films of palladium (II) oxide synthesized by oxidation in an oxygen atmosphere of initial ultrafine layers of metallic palladium of various thicknesses on SiO2/Si(100) substrates.
Conclusions: It has been established that the oxidation of the initial ultrafine layers of metallic palladium with thicknesses of ~ 95, ~ 190, and ~ 290 nm in an oxygen atmosphere in the temperature range Tox = 873 - 1123 K leads to the formation of homogeneous polycrystalline films of palladium (II) oxide on SiO2/Si (100) substrates. It is shown that the surface layers of PdO/SiO2/Si (100) films have a pronounced texture (001), the degree of which increases with increasing oxidation temperature.
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