INTERFACIAL REACTION OF CeO2 FILMS WITH TEXTURED Ni-ALLOY SUBSTRATES

Georgy A. Dosovitskiy; Vadim A. Amelichev; Sergey V. Samoilenkov; Dominique Eyidi; Bertrand Lacroix; Fabien Paumier; Dmitry P. Rodionov; Rolly J. Gaboriaud; Andrey R. Kaul

Авторы

Georgy A. Dosovitskiy Ph.D., Researcher at Neo- Chem JSC, Moscow, Russian Federation
Vadim A. Amelichev Ph.D., Researcher at SuperOx Company, Moscow, Russian Federation
Sergey V. Samoilenkov Ph.D., Chief Technology Officer at SuperOx Company, Moscow, Russian Federation
Dominique Eyidi Ph.D., Researcher at Pole Polytechnique de Recherche en Ingeniérie, Matériaux et Energétique, Chasseneuil CEDEX, France
Bertrand Lacroix Ph.D., Pole Polytechnique de Recherche en Ingeniérie, Matériaux et Energétique, Chasseneuil CEDEX, France
Fabien Paumier Ph.D., Researcher at Pole Polytechnique de Recherche en Ingeniérie, Matériaux et Energétique, Chasseneuil CEDEX, France
Dmitry P. Rodionov Dr.Sci., Leading Researcher at Institute of Metals Physics, Ural dpt. of RAS, Ekaterinburg, Russian Federation
Rolly J. Gaboriaud Professor, Head of laborattory at Pole Polytechnique de Recherche en Ingeniérie, Matériaux et Energétique, Chasseneuil CEDEX, France
Andrey R. Kaul Dr. Sci. (Chem.), Professor, Head of laborattory at Chemistry Department, Moscow State University, Moscow, Russian Federation, Chief Scientist at SuperOx Company, Moscow, Russian Federation

Ключевые слова:

alloys, oxides, thin films, interfaces, chemical vapor deposition (CVD), epitaxial growth, annealing, electron microscopy, recrystallization, phase equilibria.

Аннотация

CeO2 films were deposited on biaxially textured tapes of Ni-W and Ni-Cr-W alloys using MOCVD at 550 °C and subsequently treated in post-deposition annealing at 1000 °C and reducing atmosphere. Upon annealing of the films on the Ni-W alloy substrate, cube texture in the CeO2 films
was formed, and the oxide had an epitaxial interface with the Ni-W alloy substrate as shown by high resolution transmission electron microscopy. Similar annealing of the CeO2 films on the Ni-Cr-W alloy substrate resulted in interaction of the oxide layer with the metal substrate leading to the formation of epitaxial NiO interlayer at the CeO2/Ni-Cr-W interface.