FEATURES OF SILVER DEPOSITION IN POROUS SILICON BY ELECTRO-THERMAL DIFFUSION METHOD
Purpose. In this work, we investigated the possibility of modifying porous silicon with silver particles.
Methods and methodology. For the synthesis of substrates was used the method of electrochemical
etching in hydrofl uoric acid solutions. Аt given technological parameters was formed a porous matrix. The resulting samples were subjected to further functionalization. For the synthesis of silver ink AgNO3 was used the method of colloidal quantum dots and then by the method of electro-thermal diffusion, these particles were deposited in a porous matrix to forming a composite structure. To study the samples was used by scanning electron microscopy.
Morphology and diffusion processes were studied using SEM data. To control the functionalization
process was used the method of determining the wetting angle.
Results. Using the method of centrifugation, a silver layer was deposited on a porous silicon matrix. According to SEM data, it was established that the pore size is d = 50-100 nm, the layer thickness is 25 μm. Base on wetting angle data was concluded that the porous silicon matrix is initially hydrophobic (q ≈ 59°). After the deposition of silver particles, the hydrophobicity changes to hydrophilicity (q ≈ 31°) and further electrothermal effects have little effect on the wetting angle and the nature of hydrophilicity (q ≈ 42°).
Conclusion. As a result of research work demonstrated the effectiveness of the electro-thermal
methods for introducing silver into the porous silica matrix. It shows that the deposition of silver leads to a decrease in the hydrophobicity of the surface.
SOURCE OF FINANCING
The study was carried out with the support of the Russian Foundation for Basic Research in the framework of the scientifi c project 19-32-50038 mol_nr “Study of the morphological, physicochemical and optical properties of por-Si depending on the methods of their formation and functionalization”.
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