On the formation of the Ag2Si metastable phase in an Ag-Si film obtained by ion-beam sputtering
DOI:
https://doi.org/10.17308/kcmf.2026.28/13555Keywords:
Metastable Ag-Si-based phases, AgSi3, Ag2Si, Ag3Si, silver silicides, ion-beam sputtering, Ultra-soft X-ray emission spectroscopy (USXES), Electronic density of states (DOS)Abstract
Objectives: Nanocomposite films based on Ag-Si compounds have application in many areas of science and technology. However, their manufacturing process can be accompanied by the formation of silicides and metastable phases. In this connection, the task of developing methods for their identification arises. In this work, we attempted to solve this task using X-ray diffraction, ultra-soft X-ray emission spectroscopy, and theoretical calculations of the electron density of states for an Ag55Si45 film obtained by ion-beam sputtering of a composite target.
Experimental: As a result of comprehensive studies, a nanogranular structure of the film was revealed, with an average silver particle size of ~15 nm, separated by a matrix based on phases of amorphous silicon a-Si, SiO2, and suboxide SiO1.3, as well as a silver silicide phase. A comparison of the experimental Si L2.3 X-ray emission spectrum of the Ag55Si45 film with theoretically calculated spectra of the AgSi3, Ag2Si, and Ag3Si phases shows the best agreement with the spectrum of the Ag2Si phase. Moreover, the Ag2Si phase was detected in the works of other authors.
Conclusions: Thus, based on X-ray diffraction, X-ray emission spectroscopy, and theoretical calculations of the electronic density of states, it has been established that a metastable Ag2Si phase is formed in the Ag55Si45 film produced by ion-beam sputtering
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