STRUCTURE, MICROMORPHOLOGY AND OPTICAL PROPERTIES OF TUNGSTEN FILMS DEPOSITED BY DC MAGNETRON SPUTTERING
Abstract
Thick nontransparent tungsten films have been prepared by dc magnetron sputtering of
metal W target. Structural properties of the films have been evaluated by RHEED and SEM methods.
RHEED analysis shows that films contain a mixture of polycrystalline and amorphous components
with evident crystalline component domination. The crystalline component has been identified as cubic W, space group Im3m. SEM observation of thick W films reveals the shallow hillock micromorphology
with hillock base diameter of ~30—250 nm. The hillock micromorphology is supposedly
appeared due to internal mechanical tensions in thick W films. Dispersive optical parameters of
the W films have been measured by spectroscopic ellipsometry (SE) over spectral range of 250—
1100 nm. The instrumental spectral resolution was 2 nm, the recording time of the spectrum did not
exceed 20 s. The SE measurements were produced at three angles of incidence of light beam on the
sample of 50°, 60° and 70°. The four-zone measurement method was used with subsequent averaging
over all the four zones. To calculate the dependencies of refractive index n(l) and extinction coefficient
k(l) on optical wavelength l, the experimental data were processed using the semi-infinite
reflection medium model. The dependencies n(l) and k(l) obtained in the present experiment are in
reasonable relation with earlier known data and can be used for precise nondestructive and noncontact
thickness determination of thin semitransparent W films by SE method.
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References
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