Molecular beam epitaxy of metamorphic buffer for InGaAs/InP photodetectors with high photosensitivity in the range of 2.2–2.6 um

Authors

DOI:

https://doi.org/10.17308/kcmf.2023.25/10972

Keywords:

Molecular beam epitaxy, Metamorphic buffer, Short wavelength infrared range photodetectors, X-ray diffraction analysis, Transmission electron microscopy

Abstract

     The present work is concerned with finding optimal technological conditions for the synthesis of heterostructures with a metamorphic buffer for InGaAs/InP photodetectors in the wavelength range of 2.2–2.6 um using molecular beam epitaxy. Three choices of buffer structure differing in design and growth parameters were proposed.
      The internal structure of the grown samples was investigated by X-ray diffraction and transmission electron microscopy. Experimental data analysis has shown that the greatest degree of elastic strain relaxation in the InGaAs active layer was achieved in the sample where the metamorphic buffer formation ended with a consecutive increase and decrease in temperature. The said buffer also had InAs/InAlAs superlattice inserts.
     The dislocation density in this sample turned out to be minimal out of three, which allowed us to conclude that the described heterostructure configuration appears to be the most appropriate for manufacturing of short wavelength infrared range pin-photodetectors with high photosensitivity.

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Author Biographies

  • Elena I. Vasilkova, Saint Petersburg National Research Academic University of the Russian Academy of Sciences, Khlopina str., 8k3, lit. А, Saint Petersburg 194021, Russian Federation

    Engineer, postgraduate student
    at the Saint Petersburg National Research Academic
    University of the Russian Academy of Sciences (Saint
    Petersburg, Russian Federation).

  • Evgeny V. Pirogov, Saint Petersburg National Research Academic University of the Russian Academy of Sciences, Khlopina str., 8k3, lit. А, Saint Petersburg 194021, Russian Federation

    Researcher, Saint Petersburg
    National Research Academic University of the Russian
    Academy of Sciences (Saint Petersburg, Russian
    Federation).

  • Maxim S. Sobolev, Saint Petersburg National Research Academic University of the Russian Academy of Sciences, Khlopina str., 8k3, lit. А, Saint Petersburg 194021, Russian Federation

    Cand. Sci. (Phys.–Math.), Head
    of the Laboratory, Saint Petersburg National Research
    Academic University of the Russian Academy of
    Sciences (Saint Petersburg, Russian Federation).

  • Evgeny V. Ubiyvovk, Saint Petersburg State University, Universitetskaja nab., 7–9, Saint Petersburg 199034, Russian Federation

    Cand. Sci. (Phys.–Math.), Senior
    Researcher, Saint Petersburg State University (Saint
    Petersburg, Russian Federation).

  • Andrey M. Mizerov, Saint Petersburg National Research Academic University of the Russian Academy of Sciences, Khlopina str., 8k3, lit. А, Saint Petersburg 194021, Russian Federation

    Cand. Sci. (Phys.–Math.),
    Leading Researcher, Saint Petersburg National
    Research Academic University of the Russian Academy
    of Sciences, (Saint Petersburg, Russian Federation).

  • Pavel V. Seredin, Voronezh State University, 1 Universitetskaya pl., Voronezh 394018, Russian Federation

    Dr. Sci. (Phys.–Math.), Full
    Professor, Chair of department, Department of Solid
    State Physics and Nanostructures, Voronezh State
    University,(Voronezh, Russian Federation).

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Published

2023-03-09

Issue

Section

Original articles

How to Cite

Molecular beam epitaxy of metamorphic buffer for InGaAs/InP photodetectors with high photosensitivity in the range of 2.2–2.6 um. (2023). Kondensirovannye Sredy I Mezhfaznye Granitsy = Condensed Matter and Interphases, 25(1), 20-26. https://doi.org/10.17308/kcmf.2023.25/10972

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